Electron beam litography

The strengths of electron beam lithography include very high resolution, flexible patterning and a high reproducibility. Vistec EBPG 5000+ES HR is a modern e-beam patterning tool capable of nanometer scale patterning accuracy. The drawbacks are the relatively slow writing speed and small pattern areas.

Direct laser litography

Nanocomp has a high resolution pattern generator for direct writing with 442 nm HeCd-laser source. The system with related lithographic processes can be implemented for the manufacturing of applications that require micro-optical surface relief structures with micrometric scale.

Holographic interferometry

Holographic lithography patterning can be used for large area and uniform periodical gratings, for instance, for small display devices and outcouplers. Our setup fulfils the high quality requirements for uniform linewidth, low period variation and low scattering over the patterned area.

Nickel and glass tools for the mass production of microstructures

Applying electroforming to produce a nickel copy from the original nanoor microstructured master element is the most widely used approach to manufacture a replication tool. The process allows high-quality duplication of the master element, and therefore permits low cost production with accurate repeatability and excellent process control. Another approach is to use a manufactured glass mould directly for plastic replication. Glass moulds are advantageous in that they permit more complex structures to be used.

Manufactured tools can be used as a master element, for instance, in nano-imprint lithography technology, hot embossing, roll-to-roll embossing, UV-moulding or as a part of moulds for plastic injection moulding.

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22.12.2011

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